The Si-SiO2Interface - Electrical Properties as Determined by the Metal-Insulator-Silicon Conductance Technique

E. H. Nicollian, A. Goetzberger

Journal: Bell System Technical Journal

Publisher: Institute of Electrical and Electronics Engineers (IEEE)

Citations are the number of DOI-registered works in Crossref that cite this paper; references are how many works it cites. Full text is on the publisher site via the DOI link.